JPH0565590B2 - - Google Patents

Info

Publication number
JPH0565590B2
JPH0565590B2 JP59138334A JP13833484A JPH0565590B2 JP H0565590 B2 JPH0565590 B2 JP H0565590B2 JP 59138334 A JP59138334 A JP 59138334A JP 13833484 A JP13833484 A JP 13833484A JP H0565590 B2 JPH0565590 B2 JP H0565590B2
Authority
JP
Japan
Prior art keywords
gas supply
gas
electrode
discharge
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59138334A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6115978A (ja
Inventor
Juji Enokuchi
Hirohisa Kitano
Masanori Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP13833484A priority Critical patent/JPS6115978A/ja
Publication of JPS6115978A publication Critical patent/JPS6115978A/ja
Publication of JPH0565590B2 publication Critical patent/JPH0565590B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP13833484A 1984-07-03 1984-07-03 プラズマｃｖｄ装置 Granted JPS6115978A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13833484A JPS6115978A (ja) 1984-07-03 1984-07-03 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13833484A JPS6115978A (ja) 1984-07-03 1984-07-03 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS6115978A JPS6115978A (ja) 1986-01-24
JPH0565590B2 true JPH0565590B2 (en]) 1993-09-20

Family

ID=15219478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13833484A Granted JPS6115978A (ja) 1984-07-03 1984-07-03 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS6115978A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121429A (ja) * 1984-11-19 1986-06-09 Matsushita Electric Ind Co Ltd プラズマｃｖｄ装置
JPS61260623A (ja) * 1985-05-14 1986-11-18 Matsushita Electric Ind Co Ltd プラズマ気相成長装置
KR100476872B1 (ko) * 1997-09-26 2005-07-05 삼성전자주식회사 반도체식각설비의상측전극판

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948138B2 (ja) * 1980-05-28 1984-11-24 三洋電機株式会社 アモルフアス半導体膜の製造方法

Also Published As

Publication number Publication date
JPS6115978A (ja) 1986-01-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term